U. Czarnetzki (Ruhr-Universität Bochum, Germany)
"Ten Years of Plasma Diagnostics as ISPlasma: Progress, Challenges and Perspectives"
J. G. Han (Sungkyunkwan University, Korea)
P.Chabert (LPP,CNRS,Ecole Polytechnique, France)
"Fundamentals of Low-Temperature Plasma Physics"
P. Favia (University of Bari, Italy)
"Tutorial Introduction to Plasma Processing of Biomedical Materials"
Y. Nanishi (Ritsumeikan University, Japan)
Y. Saito (Nagoya University, Japan)
"Carbon Nanomaterials as an Electron Emitter: Fundamentals and Applications"
H. Sakakita (National Institute of Advanced Industrial Science and Technology, Japan)
"Study on International Standardization of a Low Energy Ionized Gas Haemostasis Equipment"
J.W. Bradley (University Liverpool, U.K)
"Plasma Discharges for the Ambient Processing of Materials"
W. H. Chiang (National Taiwan University of Science & Technology, Taiwan)
R. Dussart (University of Orléans, France)
"Cryogenic Processes for Silicon Deep Etching, Low-K Materials and Atomic Layer Etching"
S. Gortschakow (INP Greifswald, Germany)
"Advanced optical diagnostics for characterisation of switching and welding arcs"
J. L. He (Feng Chia University, Taiwan)
D. Rafalsky (Ecole Polytechnique, France)
"Plasma Sources of Bipolar Flows: Principles of Operation and Diagnostic Methods"
F. Tochikubo (Tokyo Metropolitan University, Japan)
J. P. Trelles (University of Massachusetts Lowell, U.S.A)
"Nonequilibrium Plasma Flows Simulation: Kinetics, Patterns, and Turbulence"
S. Chowdhury (UC Davis, U.S.A)
"Vertical Gan Transistors for Power Switching Application"
D. Feezell (The University of New Mexico, Mexico)
"High-speed Nonpolar and Semipolar Light-emitting Diodes for Visible Light Communication"
S. Keller (University of California, Santa Barbara, U.S.A)
"MOCVD of N-polar (Al,Ga,In)N heterostructures for Electronic Device Applications"
S. Krukowski (Unipress, Poland)
"Energy Dissipation During Adsorption at Solid Surfaces - The Role of Electron Transfer."
K. Nojiri (Lam ResearchCorp., Japan)
"Atomic Layer Etching of Gan and Algan using Directional Plasma-enhanced Approach"
X. L. Wang (National Institute of Advanced Industrial Science and Technology, Japan)
"Directional Micro LED based on Evanescent Wave Coupling"
N. Tansu (Lehigh University, U.S.A)
K. Yamamura (Osaka University, Japan)
"Highly Efficient Damage-free Chemical Mechanical Dry Finishing of Wide Gap Semiconductor Substrate by Plasma Assisted Polishing"
H. Chae (Sungkyunkwan University, Korea)
"Plasma-enhanced Atomic Layer Deposition and Chemical Vapor Deposition for Flexible Moisture Barrier Layers"
Y. C. Chou (National Chiao Tung University, Taiwan)
"Silicide and germanide formation in semiconductor nanowires(tentative)"
G. Dinescu (University of Bucharest, Romania)
"Cold plasma jet sources: from design to multidisciplinary applications"
K. Fukuzawa (Nagoya University, Japan)
"Novel Measurement Methods for Nano Tribological Properties"
K. Matsuda (Kyoto University, Japan)
"Studies of Optical Phenomena in Atomically Thin Two-dimensional Material and its Heterostructure for Novel Application"
K. Nagashio (The University of Tokyo, Japan)
"Understanding of Layered Heterointerfaces in 2D Semiconductors"
T. C. Wei (Chung Yuan Cristian University, Taiwan)
L. W. Yu (Nanjing University, China)
"Programming Silicon Nanowires for high Performance Large Area Electronics and Energy Applications"
M. Gherardi (University of Bologna, Italy)
H. Kano (University of Tsukuba, Japan)
J.F. Kolb (University Rostock, Germany)
E. Martines (Consorzio RFX, Italy)
"Interacting with Cellular Processes using a Helium Plasma"
M. Nagatsu (Shizuoka University, Japan)
"Tailoring Surface-functionalized Graphite-encapsulated Metal Nanoparticles by Dc and/or Rf Plasma Techniques for Biomedical and Environmental Applications"
Y. Nakatsu (Kyushu University, Japan)
K. Nakazato (Nagoya Univeristy, Japan)
T. Nozaki (Tokyo Institute of Technology, Japan)
"Nonthermal plasma-assisted catalysis of greenhouse gas"
M. Shiratani (Kyushu Univeristy, Japan)
"Nanomaterial enhanced solar cells"
T. Sugaya (National Institute of Advanced Industrial Science and Technology, Japan)
"Smart stacked heterogeneous multijunction solar cells fabricated by advanced bonding using metal nanoparticle arrays"
C. H. Wang (National Taiwan University of Science & Technology, Taiwan)
S. Chowdhury (UC Davis, U.S.A)
"Vertical GaN transistors for Power switching application"
R. A. Ferreyra (Kyoto Institute of Technology, Japan)
K. Nojiri (Lam Research Corp., Japan)
"Atomic layer etching of GaN and AlGan using directional plasma-enhanced approach"
H. Watanabe (Osaka University, Japan)
"Gate Stack Technology for Advanced GaN-based MOS Devices"
ISPlasma2018 / IC-PLANTS2018 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN
JJAP Special Issue Submission