Plasma Science & Technologies

Hiroshi Akatsuka (Institute of Science Tokyo, JAPAN)
"Mathematical Methods to Overcome Incorrect Local Optima in CR-Model Based OES Measurement"

Ryuta Ichiki (Oita Universiy, JAPAN)
"Exploring Plasma Nitriding Reactions Involving NH Radicals "

Taku Iwase (Hitachi, Ltd., JAPAN)
"Magnetic-Field Engineering of Radical Distribution and Transport in an Ecr-Based Radical Processing System"

Thorsten Bernd Lill (Lam Research, USA)
"Etching Technologies for Monolithically Integrated 3D Semiconductor Devices."

Harutyun Melikyan (Micron, USA)
"T.B.A."

Seiki Saito (Department of Computer and Information Sciences, JAPAN)
"Machine Learning-Based Dynamic Response Plasma-Material Interaction Model"

Ana Sobota (Eindhoven University of Technology, THE NETHERLAND)
"T.B.A."

Puthidhorn Thana (KMUTNB, THAILAND)
"T.B.A."