Plasma Science & Technologies

Hiroshi Akatsuka (Institute of Science Tokyo, JAPAN)
"Mathematical Methods to Overcome Incorrect Local Optima in CR-Model Based OES Measurement"

Ryuta Ichiki (Oita Universiy, JAPAN)
"Exploring Plasma Nitriding Reactions Involving NH Radicals"

Taku Iwase (Hitachi, Ltd., JAPAN)
"Magnetic-Field Engineering of Radical Distribution and Transport in an Ecr-Based Radical Processing System"

Thorsten Bernd Lill (Lam Research, USA)
"Etching Technologies for Monolithically Integrated 3D Semiconductor Devices."

Harutyun Melikyan (Micron Technology, USA)
"Tailored Voltage Waveforms in Dual-Frequency Ar/O₂ Capacitively Coupled Plasmas: Effect of Voltage Transition Slope on Ion and Electron Dynamics for Dry Etching"

Seiki Saito (Department of Computer and Information Sciences, JAPAN)
"Machine Learning-Based Dynamic Response Plasma-Material Interaction Model"

Ana Sobota (Eindhoven University of Technology, THE NETHERLAND)
"T.B.A."

Puthidhorn Thana (KMUTNB, THAILAND)
"T.B.A."